Progress in understanding of laser-produced plasmas for EUV source

Author

Miyanaga, N. ; Fujima, K. ; Fujioka, S. ; Fujimoto, Y. ; Fujita, H. ; Furukawa, H. ; Hashimoto, K. ; Hibino, T. ; Kagawa, T. ; Kato, T. ; Kawamura, T. ; Koike, F. ; Matsui, R. ; More, R. ; Murakami, M. ; Nagai, K. ; Nakai, M. ; Nakatsuka, M. ; Nishikawa,

Author_Institution

Inst. of Laser Eng., Osaka Univ., Japan

Volume

1

fYear

2003

fDate

27-28 Oct. 2003

Firstpage

297

Abstract

Our research aims at the physical understanding of laser-produced plasma (LPP) as an EUV source for lithography. To provide a database of EUV source this comprehensive research includes high performance laser development, target fabrication, plasma experiments, theory and simulations. We will report present progress of each subject, particularly recent experimental results of Sn and SnO₂ targets and comparison with computer simulations.

Keywords

plasma production by laser; plasma simulation; ultraviolet lithography; ultraviolet sources; EUV source; EUV source database; Sn target; SnO₂ target; high performance laser development; laser-produced plasmas; lithography; plasma experiments; plasma simulations; plasma theory; target fabrication; Atomic beams; Atomic measurements; Laser fusion; Laser modes; Laser theory; Plasma measurements; Plasma simulation; Plasma sources; Tin; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE

ISSN

1092-8081

Print_ISBN

0-7803-7888-1

Type

conf

DOI

10.1109/LEOS.2003.1251755

Filename

1251755