DocumentCode
405527
Title
Time-multiplexed plasma-etching of high numerical aperture paraboloidal micromirror arrays
Author
Wang, Kenvin ; Bohringer, Karl E.
Author_Institution
Dept. of Electr. Eng., Washington Univ., Seattle, WA, USA
Volume
1
fYear
2003
fDate
15-19 Dec. 2003
Abstract
This paper presents a time-multiplexed plasma-etching method for high numerical aperture paraboloidal micromirrors. By designing the appropriate opening and spacing of etching windows, one can fabricate micromirror arrays with varying focal lengths within one batch.
Keywords
etching; micromirrors; optical arrays; optical fabrication; optical windows; sputter etching; time division multiplexing; etching window; fabricate micromirror array; high numerical aperture; paraboloidal micromirror array; time-multiplexed plasma-etching; Apertures; Etching; Fabrication; Lenses; Micromirrors; Mirrors; Optical reflection; Plasma applications; Plasma properties; Resonance light scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN
0-7803-7766-4
Type
conf
DOI
10.1109/CLEOPR.2003.1274774
Filename
1274774
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