DocumentCode
413519
Title
Photochemical deposition of ZnS thin films by pulsed illumination
Author
Kobayashi, Ryohei ; Sato, Naoya ; Ichimura, Makoto ; Arai, Eisuke
Author_Institution
Dept. of Electr. & Comput. Eng., Nagoya Inst. of Technol., Aichi, Japan
Volume
1
fYear
2003
fDate
18-18 May 2003
Firstpage
137
Abstract
We prepared ZnS thin films by photochemical deposition (PCD) using continuous and pulsed illumination. The aqueous solution containing ZnSO/sub 4/, Na/sub 2/S/sub 2/O/sub 3/ and H/sub 2/SO/sub 4/ was illuminated with light from a high-pressure mercury lamp. When the illumination was continuous, the deposited film was black and not transparent. But pulsed illumination made the deposited film white and transparent. And the film deposited by pulsed illumination has photosensitivity.
Keywords
II-VI semiconductors; liquid phase deposition; photochemistry; semiconductor growth; semiconductor thin films; transparency; zinc compounds; ZnS; ZnS thin film; high-pressure mercury lamp; photochemical deposition; photosensitivity; pulsed illumination; transparency;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1305239
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