DocumentCode
421426
Title
Scaling laws of femtosecond laser induced breakdown in dielectric films
Author
Mero, M. ; Liu, J. ; Sabbah, A.J. ; Zeller, J. ; Afsing, P.M. ; McIver, J.K. ; Rudolph, W. ; Jasapara, J.
Author_Institution
Dept. of Phys. & Astron., New Mexico Univ., Albuquerque, NM, USA
Volume
2
fYear
2004
fDate
16-21 May 2004
Abstract
Measured pulse duration and band-gap scaling of the laser breakdown threshold in oxide dielectrics is explained by multiphoton and impact ionization, and relaxation. Formation of self-trapped excitons on a sub-ps time scale is observed.
Keywords
dielectric thin films; energy gap; excitons; high-speed optical techniques; impact ionisation; laser beam effects; multiphoton processes; band-gap scaling; dielectric films; femtosecond laser induced breakdown; impact ionization; laser breakdown threshold; measured pulse duration; multiphoton ionization; oxide dielectrics; relaxation; scaling laws; self-trapped excitons;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2004. (CLEO). Conference on
Conference_Location
San Francisco, CA
Print_ISBN
1-55752-777-6
Type
conf
Filename
1360615
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