DocumentCode
446542
Title
Low loss coplanar lines on low resistivity silicon SU-S thick negative photoresist
Author
Marcelli, Romolo ; Catoni, S. ; Frenguelli, L.
Author_Institution
Inst. for Microelectronics & Microsystems, CNR, Rome, Italy
Volume
1
fYear
2005
fDate
3-5 Oct. 2005
Firstpage
107
Abstract
In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-S thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.
Keywords
coplanar waveguides; electrical resistivity; elemental semiconductors; photoresists; silicon; SU-S thick negative photoresist; Si; low loss coplanar lines; low resistivity silicon; photolithographic process; transmission line structures; Conductivity; Coplanar waveguides; EPON; Microelectronics; Optical materials; Passive optical networks; Postal services; Resists; Silicon; Tellurium;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2005. CAS 2005 Proceedings. 2005 International
Print_ISBN
0-7803-9214-0
Type
conf
DOI
10.1109/SMICND.2005.1558722
Filename
1558722
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