Method of electron density measurement by Fabry-Perot interferometry

Author

Hojo, H. ; Mase, A.

Author_Institution

Plasma Res. Center, Tsukuba Univ., Japan

Volume

1

fYear

2005

fDate

19-23 Sept. 2005

Firstpage

26

Abstract

A method for determining the electron density of thin plasma by means of Fabry-Perot interferometry is proposed. The interferometer consists of two plasma layers and dielectric material surrounded by two plasma layers. The electromagnetic wave transmittance and Fabry-Perot resonances for the interferometer are calculated. It is shown that the plasma density can be determined from the measurement of the resonance frequencies. This is also applicable to the conduction electron density measurement for semiconductor films.

Keywords

Fabry-Perot interferometers; electron density; plasma density; plasma diagnostics; resonance; Fabry-Perot interferometry; Fabry-Perot resonances; conduction electron density measurement; dielectric materials; electromagnetic wave transmittance; plasma density; resonance frequencies; semiconductor films; thin plasma electron density; Density measurement; Dielectric materials; Electrons; Fabry-Perot; Interferometry; Plasma density; Plasma materials processing; Plasma measurements; Plasma waves; Resonance;

fLanguage

English

Publisher

ieee

Conference_Titel

Infrared and Millimeter Waves and 13th International Conference on Terahertz Electronics, 2005. IRMMW-THz 2005. The Joint 30th International Conference on

Print_ISBN

0-7803-9348-1

Type

conf

DOI

10.1109/ICIMW.2005.1572389

Filename

1572389