• DocumentCode
    468888
  • Title

    Extension of Universal Mobility Curve to Multi-Gate MOSFETs

  • Author

    Yoshimoto, Hiroyuki ; Sugii, Nobuyuki ; Hisamoto, Digh ; Saito, Shin-ichi ; Tsuchiya, Ryuta ; Kimura, Shin´ichiro

  • Author_Institution
    Hitachi Ltd., Tokyo
  • fYear
    2007
  • fDate
    10-12 Dec. 2007
  • Firstpage
    703
  • Lastpage
    706
  • Abstract
    The concept of "universal mobility" was successfully extended to multi-gate transistors. We developed a novel method to determine the effective electric field (Eeff) in multi-gate transistors experimentally taking all charges in and around the silicon body into account. By applying this method to double-gate (DG) transistors, we showed that Eeff goes from positive to negative, which depends on whether the front- or back- side channel is dominant. The validity of the universal relationship between mueff and Eeff was confirmed even with negative Eeff. Moreover, in the case of a symmetric DG transistor (Vfg=Vbg) like FinFETs, a high mueff can be obtained even at high gate-overdrive voltages because Eeff is always approximately zero.
  • Keywords
    MOSFET; semiconductor device measurement; silicon; FinFET; effective electric field; gate-overdrive voltages; multigate MOSFET; multigate transistors; symmetric DG transistor; universal mobility curve; Electrostatics; FinFETs; High K dielectric materials; High-K gate dielectrics; Immune system; Laboratories; MOSFETs; Quantum mechanics; Silicon; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2007. IEDM 2007. IEEE International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    978-1-4244-1507-6
  • Electronic_ISBN
    978-1-4244-1508-3
  • Type

    conf

  • DOI
    10.1109/IEDM.2007.4419043
  • Filename
    4419043