• DocumentCode
    472658
  • Title

    Radiation Damage Evaluation in an Excimer Laser Etching

  • Author

    Sekine, M. ; Okano, H. ; Yamabe, K. ; Hayasaka, N. ; Horiike, Y.

  • Author_Institution
    Toshiba VLSI Research Center, Toshiba Corp. 1, Toshiba-cho, Saiwai-ku, Kawasaki, Japan 210
  • fYear
    1985
  • fDate
    14-16 May 1985
  • Firstpage
    82
  • Lastpage
    83
  • Keywords
    Capacitance-voltage characteristics; Channel bank filters; Chemical lasers; Electrodes; Electron traps; Etching; Laser beams; Substrates; Very large scale integration; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1985. Digest of Technical Papers. Symposium on
  • Conference_Location
    Kobe, Japan
  • Print_ISBN
    4-930813-09-3
  • Type

    conf

  • Filename
    4480314
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=472658