Patterning Accuracy and Overlay Performance in Step and Repeat X-Ray Lithography

Author

Horiuchi, T. ; Deguchi, K. ; Saito, K. ; Komatsu, K. ; Miyake, M. ; Ozawa, A. ; Ohkubo, T.

Author_Institution

NTT Electrical Communications Laboratories 3-1, Morinosato Wakamiya, Atsugi-shi, Kanagawa, 243-01 Japan

fYear

1986

fDate

28-30 May 1986

Firstpage

Lastpage

Keywords

Controllability; Etching; Fabrication; Metallization; Position measurement; Resists; Substrates; Testing; Writing; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1986. Digest of Technical Papers. Symposium on

Conference_Location

San Diego, CA, USA

Type

Filename

4480344

Link To Document