DocumentCode
472781
Title
An Asymmetric Effect of Short Channel MOSFETs
Author
Koshimaru, S. ; Fukuma, M. ; Tsujide, T. ; Yamanaka, T. ; Okuto, Y.
Author_Institution
Nippon Electric Company Ltd., Kawasaki, Japan
fYear
1981
fDate
9-11 Sept. 1981
Firstpage
18
Lastpage
19
Keywords
Electric variables; Geometry; Implants; Ion implantation; MOS devices; MOSFETs; Silicon; Surface treatment; Threshold voltage; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1981. Digest of Technical Papers. Symposium on
Conference_Location
Maui, HI, USA
Type
conf
Filename
4480504
Link To Document