Low-Power Pulsed Plasma Discharge in a Water Film Reactor

Author

Wandell, Robert J. ; Locke, Bruce R.

Author_Institution

Dept. of Chem. & Biomed. Eng., Florida State Univ., Tallahassee, FL, USA

Volume

42

Issue

10

fYear

2014

fDate

Oct. 2014

Firstpage

2634

Lastpage

2635

Abstract

A pulsed plasma discharge was generated from a high pressure mixture of argon and water, which flowed into an enclosed discharge region where two stainless capillary tubes serve as both the inlet and outlet to the discharge region, as well as the anode and cathode which sustain the discharge. The system is used to investigate the potential of functionalizing simple organic compounds by soft oxidation to generate more useful chemical species.

Keywords

argon; discharges (electric); liquid films; organic compounds; oxidation; plasma chemistry; plasma materials processing; plasma sources; water; Ar-H₂O; anode; cathode; chemical species; enclosed discharge region; high pressure argon-water mixture; low-power pulsed plasma discharge; organic compounds; soft oxidation; stainless capillary tubes; water film reactor; Argon; Chemicals; Electron tubes; Hydrogen; Inductors; Liquids; Plasmas; Non thermal plasma; organic compound synthesis; plasma chemistry; plasma-liquid interactions; plasma??liquid interactions; water film; water film.;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2014.2310055

Filename

6777347