DocumentCode
474294
Title
Plasma Surface Modification of Polymer Substrates for Selective Hydrophobic Control
Author
Avram, M. ; Avram, M.A. ; Bragaru, A. ; Ghiu, A. ; Iliescu, C.
Author_Institution
Nat. Inst. for R&D in Microtechnol. (IMT-Bucharest), Bucharest
Volume
1
fYear
2007
fDate
Oct. 15 2007-Sept. 17 2007
Firstpage
91
Lastpage
94
Abstract
The main objective of this study is theoretical and experimental investigation of the surfaces modification of SU8, PDMS, SiO2 and Si by plasma RF treatment. Physical-chemical reactions at room temperature can be used for the modifications of the surfaces in plasma, by modifying the contact angle, superficial polymerization, or by creating hydrophilic regions and/or hydrophobic on the surfaces in contact with plasma. The argon-plasma annealing was used to generate the hydrophilic surfaces, and plasma of CF4 or CF4 with O2 has been used to create hydrophobic surfaces.
Keywords
annealing; microfluidics; argon-plasma annealing; physical-chemical reactions; plasma surface modification; polymer substrates; selective hydrophobic control; superficial polymerization; Microchannel; Microfluidics; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma stability; Plasma temperature; Polymers; Surface topography; Surface treatment; Microfluidic; Polymers; RIE;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 2007. CAS 2007. International
Conference_Location
Sinaia
ISSN
1545-827X
Print_ISBN
978-1-4244-0847-4
Type
conf
DOI
10.1109/SMICND.2007.4519654
Filename
4519654
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