• DocumentCode
    474294
  • Title

    Plasma Surface Modification of Polymer Substrates for Selective Hydrophobic Control

  • Author

    Avram, M. ; Avram, M.A. ; Bragaru, A. ; Ghiu, A. ; Iliescu, C.

  • Author_Institution
    Nat. Inst. for R&D in Microtechnol. (IMT-Bucharest), Bucharest
  • Volume
    1
  • fYear
    2007
  • fDate
    Oct. 15 2007-Sept. 17 2007
  • Firstpage
    91
  • Lastpage
    94
  • Abstract
    The main objective of this study is theoretical and experimental investigation of the surfaces modification of SU8, PDMS, SiO2 and Si by plasma RF treatment. Physical-chemical reactions at room temperature can be used for the modifications of the surfaces in plasma, by modifying the contact angle, superficial polymerization, or by creating hydrophilic regions and/or hydrophobic on the surfaces in contact with plasma. The argon-plasma annealing was used to generate the hydrophilic surfaces, and plasma of CF4 or CF4 with O2 has been used to create hydrophobic surfaces.
  • Keywords
    annealing; microfluidics; argon-plasma annealing; physical-chemical reactions; plasma surface modification; polymer substrates; selective hydrophobic control; superficial polymerization; Microchannel; Microfluidics; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma stability; Plasma temperature; Polymers; Surface topography; Surface treatment; Microfluidic; Polymers; RIE;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 2007. CAS 2007. International
  • Conference_Location
    Sinaia
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-4244-0847-4
  • Type

    conf

  • DOI
    10.1109/SMICND.2007.4519654
  • Filename
    4519654