DocumentCode
474750
Title
Impedance matched hyperlens
Author
Jacob, Zubin ; Kildishev, Alexander V. ; Narimanov, Evgenii E.
Author_Institution
Birck Nanotechnol. Center, Purdue Univ., West Lafayette, IN
fYear
2008
fDate
4-9 May 2008
Firstpage
1
Lastpage
2
Abstract
We develop an imaging system capable of magnification, subwavelength-resolution and impedance matching, which minimizes reflection losses. We propose a practical design of the system based on available materials and existing fabrication technologies.
Keywords
impedance matching; lenses; metamaterials; optical design techniques; optical fabrication; optical losses; optical materials; fabrication technology; imaging system design; impedance matched hyperlens; metamaterial technology; optical magnification; reflection losses; subwavelength resolution; Biomedical optical imaging; Dielectric materials; Impedance matching; Magnetic materials; Metamaterials; Optical imaging; Optical losses; Optical materials; Optical reflection; Silicon carbide; (110.0180) Microscopy; (160.1190) Anisotropic optical materials;
fLanguage
English
Publisher
iet
Conference_Titel
Lasers and Electro-Optics, 2008 and 2008 Conference on Quantum Electronics and Laser Science. CLEO/QELS 2008. Conference on
Conference_Location
San Jose, CA
Print_ISBN
978-1-55752-859-9
Type
conf
Filename
4572730
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