• DocumentCode
    478885
  • Title

    Electric-field enhancement and ion-flux focusing at the multiwire cathode of a high-current plasma-filled diode

  • Author

    Nefedtsev, E.V. ; Ozur, G.E.

  • Author_Institution
    Inst. of High-Current Electron., Russian Acad. of Sci., Tomsk
  • Volume
    1
  • fYear
    2008
  • fDate
    15-19 Sept. 2008
  • Firstpage
    235
  • Lastpage
    238
  • Abstract
    The time evolution of an unsteady ion sheath in the presence of cylindrical protrusions at the cathode is studied numerically in a two-dimensional model. The calculations demonstrate the enhancement of the electric field and the focusing of the ion flow at the protrusion vertices. It is shown that, in the stage of the sheath formation, in addition to the electrostatic focusing of the ion flux, there is also focusing caused by the curvature of the plasma boundary around a protrusion. The results of calculations agree satisfactorily with the experimental data on the delay time of explosive emission at the multi-wire cathode of a high-current plasma-filled diode. For the case of planar cathode, the analytical formulas for maximum values of electric field strength and ion current density are obtained.
  • Keywords
    cathodes; electric fields; plasma boundary layers; plasma diodes; plasma sheaths; cylindrical protrusions; electric field strength; electric-field enhancement; electrostatic focusing; explosive emission; high-current plasma-filled diode; ion-flux focusing; multiwire cathode; plasma boundary; sheath formation; Cathodes; Current density; Delay effects; Diodes; Electrostatics; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sheaths; Poisson equations;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 2008. ISDEIV 2008. 23rd International Symposium on
  • Conference_Location
    Bucharest
  • ISSN
    1093-2941
  • Print_ISBN
    978-973-755-382-9
  • Electronic_ISBN
    1093-2941
  • Type

    conf

  • DOI
    10.1109/DEIV.2008.4676763
  • Filename
    4676763