DocumentCode
478885
Title
Electric-field enhancement and ion-flux focusing at the multiwire cathode of a high-current plasma-filled diode
Author
Nefedtsev, E.V. ; Ozur, G.E.
Author_Institution
Inst. of High-Current Electron., Russian Acad. of Sci., Tomsk
Volume
1
fYear
2008
fDate
15-19 Sept. 2008
Firstpage
235
Lastpage
238
Abstract
The time evolution of an unsteady ion sheath in the presence of cylindrical protrusions at the cathode is studied numerically in a two-dimensional model. The calculations demonstrate the enhancement of the electric field and the focusing of the ion flow at the protrusion vertices. It is shown that, in the stage of the sheath formation, in addition to the electrostatic focusing of the ion flux, there is also focusing caused by the curvature of the plasma boundary around a protrusion. The results of calculations agree satisfactorily with the experimental data on the delay time of explosive emission at the multi-wire cathode of a high-current plasma-filled diode. For the case of planar cathode, the analytical formulas for maximum values of electric field strength and ion current density are obtained.
Keywords
cathodes; electric fields; plasma boundary layers; plasma diodes; plasma sheaths; cylindrical protrusions; electric field strength; electric-field enhancement; electrostatic focusing; explosive emission; high-current plasma-filled diode; ion-flux focusing; multiwire cathode; plasma boundary; sheath formation; Cathodes; Current density; Delay effects; Diodes; Electrostatics; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sheaths; Poisson equations;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 2008. ISDEIV 2008. 23rd International Symposium on
Conference_Location
Bucharest
ISSN
1093-2941
Print_ISBN
978-973-755-382-9
Electronic_ISBN
1093-2941
Type
conf
DOI
10.1109/DEIV.2008.4676763
Filename
4676763
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