DocumentCode
48870
Title
Electrostatically Reversible Polarity of Dual-Gated Graphene Transistors
Author
Nakaharai, Shu ; Iijima, Toru ; Ogawa, Shinichi ; Song-Lin Li ; Tsukagoshi, Kazuhito ; Sato, Seiki ; Yokoyama, Naoki
Author_Institution
Green Nanoelectron. Center, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
Volume
13
Issue
6
fYear
2014
fDate
Nov. 2014
Firstpage
1039
Lastpage
1043
Abstract
We developed dual-gated graphene transistors in which the transistor polarity (n-type or p-type) is electrostatically reversible by the gate bias of one of the top gates. In this device, a channel is defined as the region between a pair of top gates, where graphene is irradiated by an accelerated helium ion beam to form a defect-induced transport gap. This device features not only a large current ON-OFF ratio of four orders of magnitude but also unipolarity of transistors, which would otherwise be ambipolar. We also show how these polarity-reversible transistors can be used in logic circuits.
Keywords
electrostatic devices; graphene; ion beams; logic circuits; logic gates; nanoelectronics; thin film transistors; transistors; accelerated helium ion beam; defect induced transport gap; dual gated graphene transistors; electrostatically reversible polarity; gate bias; logic circuits; polarity reversible transistors; top gates; transistor polarity; Graphene; Helium; Inverters; Ion beams; Logic gates; Radiation effects; Transistors; Nanoelectronics; thin-film transistors;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2014.2313134
Filename
6777549
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