• DocumentCode
    48870
  • Title

    Electrostatically Reversible Polarity of Dual-Gated Graphene Transistors

  • Author

    Nakaharai, Shu ; Iijima, Toru ; Ogawa, Shinichi ; Song-Lin Li ; Tsukagoshi, Kazuhito ; Sato, Seiki ; Yokoyama, Naoki

  • Author_Institution
    Green Nanoelectron. Center, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
  • Volume
    13
  • Issue
    6
  • fYear
    2014
  • fDate
    Nov. 2014
  • Firstpage
    1039
  • Lastpage
    1043
  • Abstract
    We developed dual-gated graphene transistors in which the transistor polarity (n-type or p-type) is electrostatically reversible by the gate bias of one of the top gates. In this device, a channel is defined as the region between a pair of top gates, where graphene is irradiated by an accelerated helium ion beam to form a defect-induced transport gap. This device features not only a large current ON-OFF ratio of four orders of magnitude but also unipolarity of transistors, which would otherwise be ambipolar. We also show how these polarity-reversible transistors can be used in logic circuits.
  • Keywords
    electrostatic devices; graphene; ion beams; logic circuits; logic gates; nanoelectronics; thin film transistors; transistors; accelerated helium ion beam; defect induced transport gap; dual gated graphene transistors; electrostatically reversible polarity; gate bias; logic circuits; polarity reversible transistors; top gates; transistor polarity; Graphene; Helium; Inverters; Ion beams; Logic gates; Radiation effects; Transistors; Nanoelectronics; thin-film transistors;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2014.2313134
  • Filename
    6777549