• DocumentCode
    499648
  • Title

    Growths of InGaN quantum wells light-emitting diodes on nano-patterned AGOG sapphire substrate using abbreviated growth mode

  • Author

    Ee, Yik-Khoon ; Biser, Jeff ; Cao, Wanjun ; Chan, Helen M. ; Vinci, Richard P. ; Tansu, Nelson

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Lehigh Univ., Bethlehem, PA, USA
  • fYear
    2009
  • fDate
    2-4 June 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Nanoheteroepitaxy of InGaN-based light-emitting diodes on patterned AGOG sapphire by using abbreviated growth mode, leads to significant reduction in dislocation density and 24% increase in efficiency.
  • Keywords
    III-V semiconductors; dislocation density; epitaxial growth; gallium compounds; indium compounds; light emitting diodes; nanopatterning; quantum well devices; semiconductor growth; semiconductor quantum wells; wide band gap semiconductors; AGOG sapphire substrate; Al2O3; InGaN; abbreviated growth mode; dislocation density; light-emitting diodes; nanoheteroepitaxy; nanopatterning; quantum well growth; Annealing; Epitaxial growth; Etching; Gallium nitride; Light emitting diodes; Nanoscale devices; Nanostructures; Optical buffering; Substrates; Temperature; (230.0250) Optoelectronics; (230.3670) Light-Emitting Diodes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-55752-869-8
  • Electronic_ISBN
    978-1-55752-869-8
  • Type

    conf

  • Filename
    5224878