Optical loss reduction in HIC chalcogenide glass waveguides via thermal reflow

Author

Hu, Juejun ; Feng, Ning-Ning ; Agarwal, Anu ; Kimerling, Lionel ; Carlie, Nathan ; Petit, Laeticia ; Richardson, Kathleen

Author_Institution

Microphotonics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA

fYear

2009

fDate

2-4 June 2009

Firstpage

1

Lastpage

2

Abstract

A rapid thermal reflow technique is applied to high-index-contrast, sub-micron waveguides in As₂S₃ chalcogenide glass to reduce sidewall roughness and associated optical scattering loss. Up to 50% optical loss reduction after reflow treatment is achieved.

Keywords

arsenic compounds; chalcogenide glasses; optical glass; optical losses; optical waveguides; rapid thermal processing; ternary semiconductors; As₂S₃; chalcogenide glass waveguides; high-index-contrast waveguides; optical scattering loss reduction; rapid thermal reflow treatment; sidewall roughness; sub-micron waveguides; Glass; Integrated optics; Optical devices; Optical films; Optical losses; Optical refraction; Optical scattering; Optical variables control; Optical waveguides; Temperature; (130.3120) Integrated optics devices; (160.2750) Glass and other amorphous materials; (230.7390) Waveguides, planar; (240.5770) Roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on

Conference_Location

Baltimore, MD

Print_ISBN

978-1-55752-869-8

Electronic_ISBN

978-1-55752-869-8

Type

conf

Filename

5225198