DocumentCode
499846
Title
Low loss stoichiometric TeO2 thin films and waveguides
Author
Vu, Khu T. ; Madden, Steve J. ; Luther-Davies, Barry
Author_Institution
Laser Phys. Centre, Australian Nat. Univ., Canberra, ACT, Australia
fYear
2009
fDate
2-4 June 2009
Firstpage
1
Lastpage
2
Abstract
Stoichiometric low loss Tellurium dioxide, TeO2, films have been produced by reactive magnetron RF sputtering. Long rib waveguides with very low loss are fabricated using reactive ion etching techniques. As-deposited TeO2 films and waveguides with propagation loss around or below 0.1 dB/cm at 1550 nm have been achieved.
Keywords
optical films; optical losses; optical waveguides; sputter etching; stoichiometry; tellurium compounds; TeO2; long rib waveguides; optical waveguides; propagation loss; reactive ion etching; reactive magnetron RF sputtering; stoichiometric low loss; tellurium dioxide thin films; wavelength 1550 nm; Glass; Nonlinear optics; Optical films; Optical losses; Optical refraction; Optical waveguides; Radio frequency; Silicon compounds; Sputtering; Tellurium; (310.1860) Deposition and fabrication; (310.6860) Thin films, optical properties;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference. CLEO/QELS 2009. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-869-8
Electronic_ISBN
978-1-55752-869-8
Type
conf
Filename
5225209
Link To Document