• DocumentCode
    501905
  • Title

    An effective ESD protection system in the Back end (BE) semiconductor manufacturing facility

  • Author

    Yan, K.-P. ; Gaertner, Reinhold ; Lim, Seng

  • Author_Institution
    Infineon Technol. (Malaysia) Sdn. Bhd., Batu Berendam, Malaysia
  • fYear
    2001
  • fDate
    11-13 Sept. 2001
  • Firstpage
    124
  • Lastpage
    131
  • Abstract
    ESD protection measures in the Back-end (BE) semiconductor manufacturing environment have become more and more critical. This is due to the increased sensitivity to ESD damage of microchips from the decreasing structural geometries and increased integration density. However, the requirements for BE ESD protection have not been well understood in the semiconductor industry. Some of the commonly observed evidence of this are overkill ESD protection measures with ineffective end results. This paper provides an overview on an effective ESD protection system implementation in a BE semiconductor manufacturing facility.
  • Keywords
    electrostatic discharge; protection; radiation hardening (electronics); semiconductor device manufacture; BE semiconductor manufacturing facility; back end semiconductor manufacturing environment; effective ESD protection system; integration density; microchips; Bonding; Electrostatic discharge; Footwear; Humans; Lead compounds; Personnel; Production facilities; Protection; Wire; Wrist;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Overstress/Electrostatic Discharge Symposium, 2001. EOS/ESD '01.
  • Conference_Location
    Portland, OR
  • Print_ISBN
    978-1-5853-7039-9
  • Electronic_ISBN
    978-1-5853-7039-9
  • Type

    conf

  • Filename
    5254978