• DocumentCode
    503015
  • Title

    Chip level layout and bias considerations for preventing neighboring I/O cell interaction-induced latch-up and inter-power supply latch-up in advanced CMOS technologies

  • Author

    Huh, Yoon ; Min, Kyungjin ; Bendix, Peter ; Axelrad, Valery ; Narayan, Ravindra ; Chen, Jau-Wen ; Johnson, Larry D. ; Voldman, Steven H.

  • Author_Institution
    Global Technol. Leader, Santa Clara, CA, USA
  • fYear
    2005
  • fDate
    8-16 Sept. 2005
  • Firstpage
    1
  • Lastpage
    8
  • Abstract
    CMOS latch-up has historically been a problem in bulk CMOS processes through a parasitic pnpn structure formed by parasitic pnp and npn bipolar transistors. In application systems, latch-up is a dominant failure mode that causes either soft failure due to a loss of data logic states or destructive failure of the system. In this paper, the authors focused on cases of I/O VDD to core VDD latch-up and other cross "book" latch-up; the significance of this work shows that in 0.13 and sub-0.13 mum technologies, CMOS latch-up can occur between different VDD power supplies and between chip sub-functions. This work advances the CMOS technology by addressing chip-level layout, critical bias considerations, as well as and in conjunction with unit I/O cell level latch-up considerations for preventing neighboring I/O-to-I/O cell interaction-induced latch-up. Additionally, emission microscope (EMMI) techniques and latch-up simulation results were shown.
  • Keywords
    CMOS integrated circuits; integrated circuit layout; integrated circuit reliability; system-on-chip; CMOS latch-up; advanced CMOS technology; bias considerations; chip level layout; cross book latch-up; destructive failure; emission microscope techniques; failure mode; input/output cell interaction induced latch-up; inter power supply latch-up in; soft failure due; Bipolar transistors; CMOS logic circuits; CMOS process; CMOS technology; Electrostatic discharge; Impedance; Logic devices; Power supplies; Variable structure systems; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Overstress/Electrostatic Discharge Symposium, 2005. EOS/ESD '05.
  • Conference_Location
    Tucson, AZ
  • Print_ISBN
    978-1-58537-069-6
  • Electronic_ISBN
    978-1-58537-069-6
  • Type

    conf

  • Filename
    5271813