• DocumentCode
    503218
  • Title

    Chip to chip bonding using micro-cu bumps with sn capping layers

  • Author

    Lee, Jin Soo ; Byun, Kwang Yoo ; Chung, Qwan Ho ; Suh, Min Suk ; Kim, Seong Cheol ; Kim, Young-Ho

  • Author_Institution
    Hynix Semicond. Inc., Icheon, South Korea
  • fYear
    2009
  • fDate
    15-18 June 2009
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    The chip to chip bonding technique using a Cu bump capped with thin Sn layers has been frequently applied to 3D chip stacking technology. We studied the effect of the microstructure on the joints. The joints were fabricated by joining micro-Cu bumps capped with Sn-Ag solder with sizes of 10 mum times 10 mum, 20 mumtimes 20 mum, and 30 mum times 30 mum to Cu pads capped with Sn-Ag solder at 245degC-330degC using a thermo compression bonder. Three different types of microstructure were formed in the joints depending on the bonding condition: an Sn-rich phase with Cu6Sn5 in the Cu interfaces, Cu6Sn5 in the interior with Cu3Sn in the Cu interfaces, and one single Cu3Sn phase. The joint with only the Cu3Sn phase had the highest shear strength. Specimens were aged at 150degC for up to 1000 h. During aging, the microstructures of all the joints became Cu3Sn phase only. The shear strength of the joints was very sensitive to the formation of Cu3Sn and microvoids.
  • Keywords
    copper alloys; integrated circuit bonding; silver alloys; solders; tape automated bonding; tin alloys; 3D chip stacking technology; Cu-SnAg; chip to chip bonding technique; copper pads capped solder; microcopper bump capped solder alloys; microvoids; size 10 mum; size 20 mum; size 30 mum; solder joint fabrication; solder joint microstructure; solder joint shear strength; temperature 150 C; temperature 245 C to 330 C; thermo compression bonder; time 1000 h; tin alloy capping layers; Aerospace testing; Aging; Bonding; Electronics packaging; Materials science and technology; Microstructure; Soldering; Stacking; Through-silicon vias; Tin; Lead-free; Micro-bump; Shear test; Sn-Ag; TSV;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics and Packaging Conference, 2009. EMPC 2009. European
  • Conference_Location
    Rimini
  • Print_ISBN
    978-1-4244-4722-0
  • Electronic_ISBN
    978-0-6152-9868-9
  • Type

    conf

  • Filename
    5272982