• DocumentCode
    5043
  • Title

    An Assessment of the Bias Dependence of Displacement Damage Effects and Annealing in Silicon Charge Coupled Devices

  • Author

    Robbins, Mark S. ; Gomez Rojas, Luis

  • Author_Institution
    Surrey Satellite Technol. Ltd., Sevenoaks, UK
  • Volume
    60
  • Issue
    6
  • fYear
    2013
  • fDate
    Dec. 2013
  • Firstpage
    4332
  • Lastpage
    4340
  • Abstract
    The dependence of displacement damage effects in silicon charge coupled devices on the bias conditions during proton irradiation has been assessed. The devices have been fully characterized for dark signal increase, charge transfer degradation and the generation of random telegraph signals. A 5 to 10% higher degradation rate for all these parameters has been seen when unbiased during irradiation, under conditions typically used for a proton irradiation campaign, compared with the case when operating the devices during the irradiation. Room temperature annealing has been investigated and shows a bias dependence for all parameters tested. A reverse annealing behavior of bulk dark signal and random telegraph signals following illumination is reported for the first time. Both the annealing and reverse annealing observations may, in part, be attributed to the behavior of the trivacancy.
  • Keywords
    annealing; charge-coupled devices; elemental semiconductors; radiation hardening (electronics); silicon; Si; bias conditions; bias dependence assessment; bulk dark signal; charge transfer degradation; displacement damage effects; proton irradiation campaign; random telegraph signal generation; reverse annealing behavior; room temperature annealing; silicon charge coupled devices; temperature 293 K to 298 K; Annealing; Charge coupled devices; Dark current; Degradation; Radiation effects; Annealing; CCD image sensors; RTS; charge transfer efficiency; dark current; dark signal; displacement damage; radiation damage; random telegraph signals;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2013.2287255
  • Filename
    6678066