Electrochemical processes and characterisation of doped Tio2 thin films; Relationship between preparation conditions and nanostructure

In this paper, we report an experimental study on electrochemical anodization using different acidic electrolytes of high purity Ti thin film deposited on silicon substrate by sputtering. The dependence of pore morphology and pore formation rate on process parameters was evaluated. In order to investigate the crystallization, after anodization, samples were annealed in a quartz tube furnace at different temperatures using nitrogen gas for annealing. The influence of electrolyte composition and annealing temperature on the nanostructure and morphology of the oxide layer and the changes induced by the heat treatment, were also investigated by SEM, FTIR and Raman spectroscopy. TiO₂ film was doped with phosphorus and palladium to improve electrical conduction.