DocumentCode
505850
Title
Etched Diffraction Grating demultiplexers based on amorphous silicon nanowire platform
Author
Zhu, Ning ; Song, Jun ; Wosinski, Lech ; He, Sailing
Author_Institution
Dept. of Microelectron. & Appl. Phys., R. Inst. of Technol. (KTH), Kista, Sweden
fYear
2008
fDate
Oct. 30 2008-Nov. 2 2008
Firstpage
1
Lastpage
3
Abstract
We present some theoretical and experimental results of etched diffraction grating demultiplexer based on amorphous silicon nanowire platform, including issues with polarization sensitivity, diffraction efficiency and an application to triplexer.
Keywords
amorphous semiconductors; demultiplexing equipment; diffraction gratings; elemental semiconductors; etching; light polarisation; nanophotonics; nanowires; optical fabrication; optical materials; silicon; Si; amorphous silicon nanowire platform; diffraction efficiency; etched diffraction grating demultiplexer; polarization sensitivity; triplexer; Amorphous silicon; Arrayed waveguide gratings; Diffraction gratings; Etching; Helium; Nanoscale devices; Optical devices; Optical diffraction; Optical polarization; Refractive index;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communication & Optoelectronic Exposition & Conference, 2008. AOE 2008. Asia
Conference_Location
Shanghai
Print_ISBN
978-1-55752-863-6
Electronic_ISBN
978-1-55752-863-6
Type
conf
Filename
5348676
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