DocumentCode
510658
Title
Polarization-dependent GaN grating reflector
Author
Lee, Joonhee ; Ahn, Sungmo ; Jang, Hojoon ; Jeon, Heonsu
Author_Institution
Department of Physics and Astronomy & Inter-university Semiconductor Research Center, Seoul National University, 151-747, Korea
fYear
2009
fDate
2-6 Nov. 2009
Firstpage
1
Lastpage
2
Abstract
A GaN surface-grating reflector has been designed and fabricated. The grating structure was optimized by the rigorous coupled-wave analysis, which was followed by the fabrication using holographic lithography. Reflectance measurements revealed that the grating was highly polarization-dependent, its reflectance exceeding 90% over the spectral bandwidth of 60 nm for TE-polarization.
Keywords
Bandwidth; Fabrication; Gallium nitride; Gratings; Holography; Lithography; Optical polarization; Optical surface waves; Reflectivity; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Communications and Photonics Conference and Exhibition (ACP), 2009 Asia
Conference_Location
Shanghai, China
Print_ISBN
978-1-55752-877-3
Electronic_ISBN
978-1-55752-877-3
Type
conf
Filename
5377324
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