• DocumentCode
    510658
  • Title

    Polarization-dependent GaN grating reflector

  • Author

    Lee, Joonhee ; Ahn, Sungmo ; Jang, Hojoon ; Jeon, Heonsu

  • Author_Institution
    Department of Physics and Astronomy & Inter-university Semiconductor Research Center, Seoul National University, 151-747, Korea
  • fYear
    2009
  • fDate
    2-6 Nov. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    A GaN surface-grating reflector has been designed and fabricated. The grating structure was optimized by the rigorous coupled-wave analysis, which was followed by the fabrication using holographic lithography. Reflectance measurements revealed that the grating was highly polarization-dependent, its reflectance exceeding 90% over the spectral bandwidth of 60 nm for TE-polarization.
  • Keywords
    Bandwidth; Fabrication; Gallium nitride; Gratings; Holography; Lithography; Optical polarization; Optical surface waves; Reflectivity; Vertical cavity surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Communications and Photonics Conference and Exhibition (ACP), 2009 Asia
  • Conference_Location
    Shanghai, China
  • Print_ISBN
    978-1-55752-877-3
  • Electronic_ISBN
    978-1-55752-877-3
  • Type

    conf

  • Filename
    5377324