DocumentCode
511548
Title
Strain effects on the band structure for Si nanowires
Author
Nakamura, Hajime
Author_Institution
Tokyo Res. Lab., IBM Res., Yamato, Japan
fYear
2009
fDate
26-30 July 2009
Firstpage
555
Lastpage
558
Abstract
The present paper discusses the strain effects on the conduction and valence bands for Si nanowires using k.p Hamiltonian, where, in addition to the usual radial symmetric strains, the torsional strain, being unique to axial symmetric devices, is also studied. The radial compression/expansion, analogous with the biaxial strain in planar devices, gives linear increase/decrease in the conduction band energy whereas for valence bands, multiband-specific edge shifts and effective mass changes are discussed with effective mass ellipsoid. The torsional strain only lowers the four-fold conduction subband for [110] nanowire, which is associated with normal strain in crystal coordinate. The torsion also raises the valence band energy with no substantial changes in effective masses. For the valence band, it is also suggested that the diagonal sum for inverted effective mass nearly unchanged under strain application.
Keywords
conduction bands; effective mass; elemental semiconductors; k.p calculations; nanowires; silicon; torsion; valence bands; Si; band structure; biaxial strain; conduction band energy; four-fold conduction subband; inverted effective mass; k.p Hamiltonian; multiband-specific edge shifts; nanowires; radial compression; radial expansion; strain effects; torsional strain; valence band energy; Capacitive sensors; Effective mass; Ellipsoids; Fabrication; Logic devices; Nanoelectronics; Nanotechnology Council; Nanowires; Paper technology; Tensile stress; bandstructure; nanowire; strain; torsion;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on
Conference_Location
Genoa
ISSN
1944-9399
Print_ISBN
978-1-4244-4832-6
Electronic_ISBN
1944-9399
Type
conf
Filename
5394741
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