• DocumentCode
    520682
  • Title

    Thin film silicon solar cell fabricated at 100°C by high density plasma for flexible photovoltaic application

  • Author

    Shen, Chang-Hong ; Shieh, Jia-Min ; Kuo, Hao-Chung ; Huang, Jung Y. ; Yu, Wen-Chien ; Huang, Wen-Hsien ; Wang, Chao-Kei ; Hsu, Chih-Wei ; Lin, Yu-Hsin ; Chiu, Hung-Yu ; Dai, Bau-Tong ; Yang, Fu-Liang

  • Author_Institution
    Nat. Nano Device Labs., Hsinchu, Taiwan
  • fYear
    2010
  • fDate
    16-21 May 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Record fabrication temperature, 100°C, of a single junction amorphous Si solar cell was demonstrated by a high-density plasma method. Present solar cell revealed conversion efficiency of 7.4% at 200°C (4.1% at 135°C).
  • Keywords
    Amorphous materials; Fabrication; Photovoltaic cells; Photovoltaic systems; Plasma applications; Plasma density; Plasma temperature; Semiconductor thin films; Silicon; Solar power generation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on
  • Conference_Location
    San Jose, CA, USA
  • Print_ISBN
    978-1-55752-890-2
  • Electronic_ISBN
    978-1-55752-890-2
  • Type

    conf

  • Filename
    5500274
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=520682