Electromagnetic characterization method for on-wafer magnetic dielectric thin film materials

This paper introduces a new characterization method for on-wafer magnetic dielectric thin film materials. For this class of materials, it is necessary to determine both εr and μr from the measured characteristic impedance and propagation constant of transmission lines. This new method uses two transmission lines of the same length but with different characteristic impedances. Simulated results are presented which show very good agreement with exact values of εr and μr.