DocumentCode
522779
Title
The study of resolution of X-ray digital imaging system based on the double proximity focusing X-ray image intensifier
Author
Li Wei ; Qing, Hau
Author_Institution
Sch. of Inf. Eng., Chang´´an Univ., Xi´´an, China
Volume
1
fYear
2010
fDate
10-11 May 2010
Firstpage
261
Lastpage
265
Abstract
To the X-ray imaging system, resolution is one of the significant parameters to measure the imaging quality. In order to develop a high-resolution X-ray digital imaging system used for electronic industry, our laboratory has worked out the systemic resolution mathematical model of the X-ray imaging system. In this model, several factors are considered, such as the size of focus of the X-ray source, the double proximity focusing X-ray image intensifier and the influence of CMOS camera. Tests show the model accords with the truth. So it would have some value to the design of the similar systems.
Keywords
Digital images; Electronics industry; Focusing; High-resolution imaging; Image intensifiers; Image resolution; Laboratories; Optical imaging; Semiconductor device modeling; X-ray imaging; CMOS camera; MicroFocus X-ray source; Resolution; The double proximity focusing X-ray image intensifier;
fLanguage
English
Publisher
ieee
Conference_Titel
Optics Photonics and Energy Engineering (OPEE), 2010 International Conference on
Conference_Location
Wuhan, China
Print_ISBN
978-1-4244-5234-7
Electronic_ISBN
978-1-4244-5236-1
Type
conf
DOI
10.1109/OPEE.2010.5508135
Filename
5508135
Link To Document