• DocumentCode
    522779
  • Title

    The study of resolution of X-ray digital imaging system based on the double proximity focusing X-ray image intensifier

  • Author

    Li Wei ; Qing, Hau

  • Author_Institution
    Sch. of Inf. Eng., Chang´´an Univ., Xi´´an, China
  • Volume
    1
  • fYear
    2010
  • fDate
    10-11 May 2010
  • Firstpage
    261
  • Lastpage
    265
  • Abstract
    To the X-ray imaging system, resolution is one of the significant parameters to measure the imaging quality. In order to develop a high-resolution X-ray digital imaging system used for electronic industry, our laboratory has worked out the systemic resolution mathematical model of the X-ray imaging system. In this model, several factors are considered, such as the size of focus of the X-ray source, the double proximity focusing X-ray image intensifier and the influence of CMOS camera. Tests show the model accords with the truth. So it would have some value to the design of the similar systems.
  • Keywords
    Digital images; Electronics industry; Focusing; High-resolution imaging; Image intensifiers; Image resolution; Laboratories; Optical imaging; Semiconductor device modeling; X-ray imaging; CMOS camera; MicroFocus X-ray source; Resolution; The double proximity focusing X-ray image intensifier;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optics Photonics and Energy Engineering (OPEE), 2010 International Conference on
  • Conference_Location
    Wuhan, China
  • Print_ISBN
    978-1-4244-5234-7
  • Electronic_ISBN
    978-1-4244-5236-1
  • Type

    conf

  • DOI
    10.1109/OPEE.2010.5508135
  • Filename
    5508135