DocumentCode
528002
Title
The effect of Gamma-Ray dosage on the fabrication of lithium niobate ridge structures
Author
Chang, Chia-Hao ; Wei, Yuan-Yaw ; Wang, Way-Seen
Author_Institution
Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear
2010
fDate
5-9 July 2010
Firstpage
234
Lastpage
235
Abstract
Ridge structures are fabricated on lithium niobate substrates with gamma-ray irradiation of various dosages. Experimental results show the maximum depth and aspect-ratio can be obtained when the dosages are 163 and 325 krad, respectively.
Keywords
gamma-ray effects; lithium compounds; optical modulation; ridge waveguides; gamma-ray dosage; gamma-ray irradiation; lithium niobate ridge structure fabrication; Lithium niobate; Optical device fabrication; Optical waveguides; Protons; Radiation effects; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
OptoElectronics and Communications Conference (OECC), 2010 15th
Conference_Location
Sapporo
Print_ISBN
978-1-4244-6785-3
Type
conf
Filename
5587933
Link To Document