• DocumentCode
    530900
  • Title

    Dependence of FET/HEMT reliability on substrate thickness and gate length

  • Author

    Darwish, Ali M. ; Hung, H. Alfred

  • Author_Institution
    RF Electron. Dept., Army Res. Lab., Adelphi, MD, USA
  • fYear
    2010
  • fDate
    27-28 Sept. 2010
  • Firstpage
    262
  • Lastpage
    265
  • Abstract
    The transistor substrate has a significant role on RF losses, device heating, and reliability. The substrate thickness, and the gate length, among other parameters, have direct implications on the transistor lifetime. This paper presents an analytical expression relating the reliability to gate length and to substrate thickness for a field effect transistor (FET), or a high electron mobility transistor (HEMT), based on thermal considerations. Experimental observations support the model´s predicted results. The derived methodology and analytical expressions are useful for device/MMIC designers to assess the device/circuit reliability performance.
  • Keywords
    field effect MMIC; high electron mobility transistors; semiconductor device reliability; FET-HEMT reliability; MMIC designers; RF losses; device heating; field effect transistor; gate length; high electron mobility transistor; substrate thickness; thermal considerations; transistor lifetime; transistor substrate; Gallium arsenide; Logic gates; Reliability; Sensitivity; Silicon; Substrates; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Integrated Circuits Conference (EuMIC), 2010 European
  • Conference_Location
    Paris
  • Print_ISBN
    978-1-4244-7231-4
  • Type

    conf

  • Filename
    5613674