DocumentCode
539437
Title
Yield monitoring system for silicon wafer
Author
Kogure, Mayumi ; Hirano, Yori ; Shindo, Wataru
Author_Institution
Spansion Japan Limited, Aizuwakamatsu-Shi, Fukushima, Japan
fYear
2008
fDate
27-29 Oct. 2008
Firstpage
398
Lastpage
401
Abstract
Wafer quality monitoring is getting more and more important for device makers because device/process margin against wafer quality variability get smaller and smaller as the technology shrinks. We developed a yield reporting system for wafer quality data monitoring. This system enables us to detect yield degradation caused by silicon wafer and also to improve yield by monitoring difference among wafer suppliers. Several use cases of detecting yield degradation and improving yield are described in this paper.
Keywords
Annealing; Conductivity; Metals; Monitoring; Pollution measurement; Semiconductor device measurement; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location
Tokyo, Japan
ISSN
1523-553X
Electronic_ISBN
1523-553X
Type
conf
Filename
5714959
Link To Document