• DocumentCode
    539437
  • Title

    Yield monitoring system for silicon wafer

  • Author

    Kogure, Mayumi ; Hirano, Yori ; Shindo, Wataru

  • Author_Institution
    Spansion Japan Limited, Aizuwakamatsu-Shi, Fukushima, Japan
  • fYear
    2008
  • fDate
    27-29 Oct. 2008
  • Firstpage
    398
  • Lastpage
    401
  • Abstract
    Wafer quality monitoring is getting more and more important for device makers because device/process margin against wafer quality variability get smaller and smaller as the technology shrinks. We developed a yield reporting system for wafer quality data monitoring. This system enables us to detect yield degradation caused by silicon wafer and also to improve yield by monitoring difference among wafer suppliers. Several use cases of detecting yield degradation and improving yield are described in this paper.
  • Keywords
    Annealing; Conductivity; Metals; Monitoring; Pollution measurement; Semiconductor device measurement; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2008 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • ISSN
    1523-553X
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5714959