• DocumentCode
    556242
  • Title

    Studies on oscillator strength of nanostructured amorphous, anatase and rutile TiO2 films

  • Author

    Sankar, S. ; Gopchandran, K.G.

  • Author_Institution
    Dept. of Optoelectron., Univ. of Kerala, Kariavattom, India
  • fYear
    2011
  • fDate
    5-7 Oct. 2011
  • Firstpage
    1
  • Lastpage
    10
  • Abstract
    Nanocrystalline thin films of amorphous, anatase and rutile titanium dioxide are prepared using pulsed laser deposition technique. The refractive indices of these films are determined from the optical transmittance spectra using Swanepol method. The optical band gap, optical conductivity, complex dielectric constant and dissipation factor of the films grown under different conditions are calculated. The oscillator strength of these films, calculated using Wemple and Didomenico model, is found to be sensitive not only to the phase, but also to the oxidation kinetics under which the films are formed.
  • Keywords
    energy gap; nanostructured materials; oxidation; permittivity; pulsed laser deposition; reaction kinetics; refractive index; thin films; titanium compounds; Didomenico model; Swanepol method; TiO2; Wemple model; amorphous titanium dioxide; anatase films; complex dielectric constant; dissipation factor; nanocrystalline thin films; nanostructured amorphous films; optical band gap; optical conductivity; optical transmittance spectra; oscillator strength; oxidation kinetics; pulsed laser deposition; refractive indices; rutile films; Dispersion; Optical films; Optical filters; Optical refraction; Optical sensors; Optical variables control; Dielectric constant; Optical dispersion parameters; Oscillator strength;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultra Modern Telecommunications and Control Systems and Workshops (ICUMT), 2011 3rd International Congress on
  • Conference_Location
    Budapest
  • ISSN
    2157-0221
  • Print_ISBN
    978-1-4577-0682-0
  • Type

    conf

  • Filename
    6078946