DocumentCode
556242
Title
Studies on oscillator strength of nanostructured amorphous, anatase and rutile TiO2 films
Author
Sankar, S. ; Gopchandran, K.G.
Author_Institution
Dept. of Optoelectron., Univ. of Kerala, Kariavattom, India
fYear
2011
fDate
5-7 Oct. 2011
Firstpage
1
Lastpage
10
Abstract
Nanocrystalline thin films of amorphous, anatase and rutile titanium dioxide are prepared using pulsed laser deposition technique. The refractive indices of these films are determined from the optical transmittance spectra using Swanepol method. The optical band gap, optical conductivity, complex dielectric constant and dissipation factor of the films grown under different conditions are calculated. The oscillator strength of these films, calculated using Wemple and Didomenico model, is found to be sensitive not only to the phase, but also to the oxidation kinetics under which the films are formed.
Keywords
energy gap; nanostructured materials; oxidation; permittivity; pulsed laser deposition; reaction kinetics; refractive index; thin films; titanium compounds; Didomenico model; Swanepol method; TiO2; Wemple model; amorphous titanium dioxide; anatase films; complex dielectric constant; dissipation factor; nanocrystalline thin films; nanostructured amorphous films; optical band gap; optical conductivity; optical transmittance spectra; oscillator strength; oxidation kinetics; pulsed laser deposition; refractive indices; rutile films; Dispersion; Optical films; Optical filters; Optical refraction; Optical sensors; Optical variables control; Dielectric constant; Optical dispersion parameters; Oscillator strength;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultra Modern Telecommunications and Control Systems and Workshops (ICUMT), 2011 3rd International Congress on
Conference_Location
Budapest
ISSN
2157-0221
Print_ISBN
978-1-4577-0682-0
Type
conf
Filename
6078946
Link To Document