DocumentCode
570938
Title
Plasma and ion beam processing at Los Alamos
Author
Rej, D.J. ; Davis, H.A. ; Henins, I. ; Reass, William A. ; Scheuer, J.T. ; Tobin, J.A. ; Tuszewski, M. ; Waganaar, W.J. ; Wood, B.P. ; Johnston, G.P. ; Nastasi, M. ; Muenchausen, R.E. ; Walter, K.C. ; Williams, Douglas B. ; Faehl, R.J. ; Conrad, J.R. ; Ho
Author_Institution
Physics Division, Los Alamos National Laboratory, NM 87545, USA
Volume
1
fYear
1994
fDate
20-24 June 1994
Firstpage
222
Lastpage
225
Abstract
Efforts are underway at Los Alamos National Laboratory to utilize plasma and intense ion beam science and technology for the processing of advanced materials. A major theme involves surface modification of materials, e.g., etching, deposition, alloying, and implantation. In this paper, we concentrate on two programs, plasma source ion implantation and high-intensity pulsed ion beam deposition.
fLanguage
English
Publisher
iet
Conference_Titel
High-Power Particle Beams, 1994 10th International Conference on
Conference_Location
San Diego, CA, USA
Print_ISBN
978-1-4244-1518-2
Type
conf
Filename
6304432
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