DocumentCode
587819
Title
Monte Carlo simulation of InGaAs/strained-InAs/InGaAs channel HEMTs considering self-consistent analysis of 2-dimensional electron gas
Author
Endoh, Akira ; Watanabe, Issei ; Mimura, Takashi
Author_Institution
Nat. Inst. of Inf. & Commun. Technol. (NICT), Koganei, Japan
fYear
2012
fDate
27-30 Aug. 2012
Firstpage
48
Lastpage
51
Abstract
We calculated the unstrained and the strained band structures of InAs and carried out Monte Carlo simulation of InGaAs/strained-InAs/InGaAs composite channel high electron mobility transistors (HEMTs) considering 2-dimensional electron gas (2DEG) self-consistent analysis by solving Schrödinger and Poisson equations. With considering the effect of 2DEG, the drain-source current Ids decreases. However, the negative threshold voltage shift due to the short-channel effects is not affected by considering 2DEG. The threshold voltage shift occurs in the region Lg/d <; ~5 (Lg: gate length, d: sum of the barrier and channel layer thicknesses). At Lg = 20 nm, the simulated cutoff frequency fT values were 943 GHz without 2DEG and 813 GHz with 2DEG. The trend of the fT values with Lg reflects that of the electron velocities mainly.
Keywords
III-V semiconductors; Monte Carlo methods; Poisson equation; SCF calculations; Schrodinger equation; band structure; gallium arsenide; high electron mobility transistors; indium compounds; two-dimensional electron gas; 2-dimensional electron gas; 2DEG; InAs-InGaAs; InGaAs-strained-InAs-InGaAs channel HEMT; Monte Carlo simulation; Poisson equation; Schrodinger equation; band structures; drain-source current; electron velocity; frequency 813 GHz; frequency 943 GHz; high electron mobility transistors; negative threshold voltage shift; self-consistent analysis; short-channel effects; simulated cut-off frequency; Cutoff frequency; HEMTs; Indium gallium arsenide; Logic gates; MODFETs; Monte Carlo methods; Threshold voltage; ƒT ; 2-dimensional electron gas; Band structure; HEMTs; Monte Carlo simulation; cutoff frequency; strained InAs; threshold voltage shift;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials (IPRM), 2012 International Conference on
Conference_Location
Santa Barbara, CA
ISSN
1092-8669
Print_ISBN
978-1-4673-1725-2
Type
conf
DOI
10.1109/ICIPRM.2012.6403315
Filename
6403315
Link To Document