• DocumentCode
    5980
  • Title

    Thermal Cycling Reliability Study of Ag–In Joints Between Si Chips and Cu Substrates Made by Fluxless Processes

  • Author

    Yuan-Yun Wu ; Nwoke, Dominic ; Barlow, Fred D. ; Lee, C.C.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Irvine, Irvine, CA, USA
  • Volume
    4
  • Issue
    9
  • fYear
    2014
  • fDate
    Sept. 2014
  • Firstpage
    1420
  • Lastpage
    1426
  • Abstract
    The purpose of this research is to assess the reliability of Ag-In joints in thermal cycling (TC) environment. Si chips and Cu substrates were bonded using silver (Ag) and indium (In) multilayer structure without applying any flux. After bonding, the samples were annealed in air at 250 °C for 190 h to convert the joint into an alloy of small intermetallic grains and solid solution (Ag). The resulting joint has a melting temperature higher than 800 °C. Si-Cu pair was chosen because of the large coefficient of thermal expansion mismatch, i.e., 2.7 × 10-6/°C of Si versus 17 × 10-6/°C of Cu. Two TC tests were performed. All 10 samples passed 100 cycles of initial TC test between -40 °C and 85 °C. They were then subjected to 5000 cycles of TC test between -40 °C and 200 °C. Seven of ten samples survived beyond 5000 cycles. Three samples broke at 850, 2600, and 3000 cycles, respectively. The early failure was probably caused by imperfections and defects in the joints. Based upon these results, it seems that our Ag-In joints compare favorably with sintered silver joints. The Ag-In joints not only have high-melting temperature but also survive harsh TC environment.
  • Keywords
    aluminium alloys; annealing; copper; elemental semiconductors; failure analysis; indium alloys; integrated circuit bonding; integrated circuit packaging; integrated circuit reliability; silicon; solders; solid solutions; thermal expansion; Ag-In; Cu; Si; TC environment; TC tests; coefficient of thermal expansion mismatch; early failure; fluxless processes; high-melting temperature; multilayer structure; small intermetallic grains; solid solution; temperature -40 degC to 200 degC; temperature 250 degC; thermal cycling reliability; time 190 h; Annealing; Bonding; Joints; Reliability; Silicon; Substrates; Electronic packaging; high-temperature electronics; indium; silver; silver solid solution; silver–indium alloys; silver-indium alloys; thermal cycling (TC) test;
  • fLanguage
    English
  • Journal_Title
    Components, Packaging and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    2156-3950
  • Type

    jour

  • DOI
    10.1109/TCPMT.2014.2331054
  • Filename
    6868954