DocumentCode
598736
Title
Keynote Address: Device reliability physics: Past, present, and future
Author
Stathis, James
Author_Institution
IBM
fYear
2012
fDate
14-18 Oct. 2012
Abstract
Summary form only given. The importance of CMOS reliability grows as the world becomes more interconnected and instrumented. At the same time, the understanding of CMOS reliability is continuously challenged and transformed by the rapid evolution of technology. The recent introduction of new materials and structures (high-k, metal-gates, and FinFETs) challenges our understanding and ability to rapidly qualify new technologies. This talk will offer a selective retrospective of reliability physics in old-fashioned SiO2 -based MOSFETs with poly-Si gates, and explore the extent to which the old models remain valid in present-day and future technologies.
fLanguage
English
Publisher
ieee
Conference_Titel
Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
Conference_Location
South Lake Tahoe, CA
ISSN
1930-8841
Print_ISBN
978-1-4673-2749-7
Type
conf
DOI
10.1109/IIRW.2012.6468899
Filename
6468899
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