• DocumentCode
    598736
  • Title

    Keynote Address: Device reliability physics: Past, present, and future

  • Author

    Stathis, James

  • Author_Institution
    IBM
  • fYear
    2012
  • fDate
    14-18 Oct. 2012
  • Abstract
    Summary form only given. The importance of CMOS reliability grows as the world becomes more interconnected and instrumented. At the same time, the understanding of CMOS reliability is continuously challenged and transformed by the rapid evolution of technology. The recent introduction of new materials and structures (high-k, metal-gates, and FinFETs) challenges our understanding and ability to rapidly qualify new technologies. This talk will offer a selective retrospective of reliability physics in old-fashioned SiO2-based MOSFETs with poly-Si gates, and explore the extent to which the old models remain valid in present-day and future technologies.
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IRW), 2012 IEEE International
  • Conference_Location
    South Lake Tahoe, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4673-2749-7
  • Type

    conf

  • DOI
    10.1109/IIRW.2012.6468899
  • Filename
    6468899