DocumentCode
621035
Title
Monte Carlo simulation of InAlAs/InGaAs HEMTs with buried gate
Author
Endoh, Akira ; Watanabe, Issei ; Kasamatsu, Akifumi ; Mimura, Takashi
Author_Institution
Nat. Inst. of Inf. & Commun. Technol., Koganei, Japan
fYear
2013
fDate
19-23 May 2013
Firstpage
1
Lastpage
2
Abstract
We carried out Monte Carlo (MC) simulation of InAlAs/InGaAs high electron mobility transistors (HEMTs) with buried gate. We employed a T-shaped structure as a gate electrode. The maximum transconductance gm_max and gate capacitance Cg increase with increasing the buried depth d. The extent of increase in the gm_max is more than that in Cg. As a result, the cutoff frequency fT increases with increase the buried depth d. These phenomena agree with our previous experimental results.
Keywords
III-V semiconductors; Monte Carlo methods; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; HEMT; InAlAs-InGaAs; Monte Carlo simulation; T-shaped structure; buried gate; gate capacitance; gate electrode; high electron mobility transistors; Capacitance; Cutoff frequency; HEMTs; Logic gates; MODFETs; Scattering; Transconductance; HEMTs; InAlAs; InGaAs; Monte Carlo simulation; cutoff frequency; gate capacitance; transconductance;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials (IPRM), 2013 International Conference on
Conference_Location
Kobe
ISSN
1092-8669
Print_ISBN
978-1-4673-6130-9
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2013.6562605
Filename
6562605
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