• DocumentCode
    633200
  • Title

    Low-polarization-dependent silica waveguide monolithically integrated on SOI photonic platform

  • Author

    Nishi, Hidetaka ; Tsuchizawa, Tai ; Kou, Rai ; Fukuda, Hiroshi ; Yamada, Koji

  • Author_Institution
    Nanophotonics Center, NTT Corp., Atsugi, Japan
  • fYear
    2013
  • fDate
    June 30 2013-July 4 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We developed a low-polarization-dependent silica waveguide, which was based on multi-layer core and fabricated at low temperature. We experimentally confirmed its low polarization dependence, and monolithically integrated it with silicon photonic dynamic devices.
  • Keywords
    integrated optics; optical fabrication; optical multilayers; optical waveguides; silicon compounds; silicon-on-insulator; SOI photonic platform; SiO2; low polarization dependence; monolithic integration; multilayer core; optical fabrication; silica waveguide; Arrayed waveguide gratings; Attenuation; Fabrication; Photonics; Silicon; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    OptoElectronics and Communications Conference held jointly with 2013 International Conference on Photonics in Switching (OECC/PS), 2013 18th
  • Conference_Location
    Kyoto
  • Type

    conf

  • Filename
    6597334
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=633200