• DocumentCode
    633603
  • Title

    Physical Design and Verification for Embedded CPU under Deep Submicron Technology

  • Author

    Ran Fan ; Zheng Dandan

  • Author_Institution
    Inst. of VLSI Design, Zhejiang Univ., Hangzhou, China
  • fYear
    2013
  • fDate
    29-30 June 2013
  • Firstpage
    921
  • Lastpage
    924
  • Abstract
    To overcome the challenges brought by the scale down of feature size, a flow of physical design and verification for embedded CPU under deep submicron technology is put forward in this paper. New problems are encountered in timing closure, signal integrity, IR drop and antenna effect, so we must select the effective EDA tools and develop new flow of physical design and verification combining with the characteristics of circuit under deep submicron technology. New challenges are analyzed, especially the interconnect line effect, and how to prevent the crosstalk and ensure the timing performance has been discussed. The embedded CPU CK610 using 0.13um 1P4M CMOS process technology has been completed by this new flow and the result indicates this chip complies with all requirements.
  • Keywords
    CMOS integrated circuits; electronic design automation; logic design; CMOS process technology; EDA tool; IR drop; antenna effect; crosstalk; deep submicron technology; embedded CPU; interconnect line effect; signal integrity; size 0.13 micron; timing closure; Automation; Manufacturing; Deep Submicron; Embedded CPU; Physical Design; Verification;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Digital Manufacturing and Automation (ICDMA), 2013 Fourth International Conference on
  • Conference_Location
    Qingdao
  • Type

    conf

  • DOI
    10.1109/ICDMA.2013.217
  • Filename
    6598140