DocumentCode
633895
Title
Failure localization methods for system-on-chip (SoC) using photon emission microscopy
Author
Chen, Yuanfeng ; Chen, Huanting ; Zhang, X.W. ; Lai, P.
Author_Institution
Sci. & Technol. on Reliability Phys. & Applic. of Electron. Component Lab., Fifth Electron. Res. Inst. of Minist. of Ind. & Inf. Technol., Guangzhou, China
fYear
2013
fDate
15-19 July 2013
Firstpage
591
Lastpage
594
Abstract
System-on-Chip (SoC) is a major revolution in IC design where the whole functionality of a system is placed on a single chip. Its advantages include high performance, shorter design cycle time and space efficiency. But due to the circuit complexity, the high pin counts and ever increasing operating frequencies, System-on-Chip (SoC) devices drive the most challenging requirements for failure localization and mechanism analysis. PEM (Photon Emission Microscopy) analysis is important for failure analysis as they can help to locate the failed device directly or point out the analysis direction. This paper presents the failure localization method for System-on-Chip (SoC) using Photon Emission Microscope (PEM) and gives several successful failure analysis cases using PEM locating the failure site and FIB (Focused Ion Beam) and SEM (Scanning electronic Microscope) analyzing the failure mechanism.
Keywords
failure analysis; focused ion beam technology; photoelectron microscopy; scanning electron microscopy; system-on-chip; FIB; PEM analysis; SEM; SoC; failure localization; failure mechanism; failure site; focused ion beam; mechanism analysis; photon emission microscopy; scanning electronic microscope; system-on-chip; Failure analysis; Optical microscopy; Photonics; Scanning electron microscopy; System-on-chip;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits (IPFA), 2013 20th IEEE International Symposium on the
Conference_Location
Suzhou
ISSN
1946-1542
Print_ISBN
978-1-4799-1241-4
Type
conf
DOI
10.1109/IPFA.2013.6599230
Filename
6599230
Link To Document