Pattern synthesis of a smart skin array with low cross-polarization

A feasible method for synthesizing smart skin conformal array and optimizing low cross-polarization is proposed. Starting from the far-field superposition principle, an active element pattern technique including element mutual coupling and mounted platform effects is used to calculate the far-field patterns. A coordinate transform is applied to create polarization quantities, and a general process for the element polarized pattern transformation is performed. Corresponding numerical example is given and the desired sidelobe level and low cross-polarization is optimized. The numerical results indicate the proposed method is valid.