DocumentCode
673766
Title
Electromagnetic analysis for interconnect structures with inhomogeneous substrates
Author
Yang, Kun ; Zhou, J.C. ; Sheng, W.T. ; Zhu, Z.Y. ; Tong, Mei Song
Author_Institution
Dept. of Electron. Sci. & Technol., Tongji Univ., Shanghai, China
fYear
2013
fDate
7-13 July 2013
Firstpage
1540
Lastpage
1541
Abstract
Electromagnetic (EM) analysis for interconnect and packaging structures usually relies on the solutions of surface integral equations (SIEs) with an assumption of homogeneous substrates in integral equation solvers. In this work, we consider the inhomogeneity of substrates and replace the SIEs with the volume integral equations (VIEs) to form volume-surface integral equations (VSIEs) for the structures. The VSIEs are solved by the method of moments (MoM) with the Rao-Wilton-Glisson (RWG) and Schaubert-Wilton-Glisson (SWG) basis functions and could be more versatile for inhomogeneous problems. A numerical example is presented to demonstrate the effectiveness of the approach.
Keywords
dielectric devices; electric field integral equations; integrated circuit interconnections; magnetic field integral equations; method of moments; packaging; substrates; MoM; RWG; Rao-Wilton-Glisson basis functions; SIE; Schaubert-Wilton-Glisson basis functions; VSIE; dielectric substrates; electromagnetic analysis; homogeneous substrates; inhomogeneous substrates; interconnect structures; method-of-moments; microelectronic devices; packaging structures; surface integral equations; volume-surface integral equations; Conductors; Current density; Integral equations; Method of moments; Nonhomogeneous media; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Antennas and Propagation Society International Symposium (APSURSI), 2013 IEEE
Conference_Location
Orlando, FL
ISSN
1522-3965
Print_ISBN
978-1-4673-5315-1
Type
conf
DOI
10.1109/APS.2013.6711429
Filename
6711429
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