• DocumentCode
    692159
  • Title

    Heat dissipation mechanisms in resistive switching devices

  • Author

    Yalon, E. ; Ritter, Daniel ; Riess, I.

  • Author_Institution
    Electr. Eng. Dept., Technion - Israel Inst. of Technol., Haifa, Israel
  • fYear
    2013
  • fDate
    12-14 Aug. 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The local temperature plays a key role in resistive switching devices. We have previously presented a method to experimentally evaluate the filament temperature using metal-insulator-semiconductor bipolar transistor structure. In light of the experimental results, we discuss here the various possible heat dissipation mechanisms, and compare thermal simulations to the measured temperatures. The simulations are consistent with our experimental data for a filament tip diameter of ~1nm.
  • Keywords
    bipolar transistors; cooling; random-access storage; semiconductor device packaging; Joule heating; heat dissipation mechanism; metal-insulator-semiconductor bipolar transistor structure; resistive RAM; resistive switching devices; thermal simulations; Bipolar transistors; Electrodes; Heating; Switches; Thermal conductivity; Thermal resistance; Tunneling; Joule heating; RRAM; bipolar transistor; conductive filaments; resistive switching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium (NVMTS), 2013 13th
  • Conference_Location
    Minneapolis, MN
  • Type

    conf

  • DOI
    10.1109/NVMTS.2013.6851051
  • Filename
    6851051