• DocumentCode
    692246
  • Title

    Simulation of piezoresistive mems tactile sensor

  • Author

    Sathyanarayana ; Rai, Rajesh ; Jayaram

  • Author_Institution
    Dept. of Mechatron., Mangalore Inst. of Technol. & Eng., Moodabidri, India
  • fYear
    2013
  • fDate
    27-28 Sept. 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The cost of the silicon-based MEMS fabrication is still relatively high, thus an alternative process should be developed for low cost applications. In this proposal, we are planning to develop a low-cost non-silicon-based process for MEMS tactile sensor fabrication. The MEMS tactile sensor with a trampoline membrane structure will be fabricated by sputtering of Cr, Al, AlN, Bariun Titanate (BaTiO3), and Au layers through electroplated Ni microshadow masks over an 8μm-thick photoresist sacrificial layer on sapphire substrate. For the fabrication of efficient MEMS tactile sensor the proposed structure will be simulated using COMSOL, commercial MEMS simulation software.
  • Keywords
    aluminium; aluminium compounds; barium compounds; chromium; gold; membranes; microfabrication; microsensors; nickel; photoresists; piezoresistive devices; sputter deposition; tactile sensors; Al; Al2O3; AlN; Au; BaTiO3; COMSOL; Cr; Ni; electroplated Ni microshadow masks; photoresist sacrificial layer; piezoresistive MEMS tactile sensor; sapphire substrate; size 8 mum; sputtering; trampoline membrane structure; MEMS; Physical sensor; Tactile sensor; Thin film sensor;
  • fLanguage
    English
  • Publisher
    iet
  • Conference_Titel
    Research & Technology in the Coming Decades (CRT 2013), National Conference on Challenges in
  • Conference_Location
    Ujire
  • Electronic_ISBN
    978-1-84919-868-4
  • Type

    conf

  • DOI
    10.1049/cp.2013.2549
  • Filename
    6851596