DocumentCode
692246
Title
Simulation of piezoresistive mems tactile sensor
Author
Sathyanarayana ; Rai, Rajesh ; Jayaram
Author_Institution
Dept. of Mechatron., Mangalore Inst. of Technol. & Eng., Moodabidri, India
fYear
2013
fDate
27-28 Sept. 2013
Firstpage
1
Lastpage
4
Abstract
The cost of the silicon-based MEMS fabrication is still relatively high, thus an alternative process should be developed for low cost applications. In this proposal, we are planning to develop a low-cost non-silicon-based process for MEMS tactile sensor fabrication. The MEMS tactile sensor with a trampoline membrane structure will be fabricated by sputtering of Cr, Al, AlN, Bariun Titanate (BaTiO3), and Au layers through electroplated Ni microshadow masks over an 8μm-thick photoresist sacrificial layer on sapphire substrate. For the fabrication of efficient MEMS tactile sensor the proposed structure will be simulated using COMSOL, commercial MEMS simulation software.
Keywords
aluminium; aluminium compounds; barium compounds; chromium; gold; membranes; microfabrication; microsensors; nickel; photoresists; piezoresistive devices; sputter deposition; tactile sensors; Al; Al2O3; AlN; Au; BaTiO3; COMSOL; Cr; Ni; electroplated Ni microshadow masks; photoresist sacrificial layer; piezoresistive MEMS tactile sensor; sapphire substrate; size 8 mum; sputtering; trampoline membrane structure; MEMS; Physical sensor; Tactile sensor; Thin film sensor;
fLanguage
English
Publisher
iet
Conference_Titel
Research & Technology in the Coming Decades (CRT 2013), National Conference on Challenges in
Conference_Location
Ujire
Electronic_ISBN
978-1-84919-868-4
Type
conf
DOI
10.1049/cp.2013.2549
Filename
6851596
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