DocumentCode
707931
Title
A wafer level vacuum packaged silicon vibration beam accelerometer
Author
Guo-ming Xia ; An-ping Qiu ; Qin Shi ; Yan Su
Author_Institution
MEMS Inertial Technol. Res. Center, Nanjing Univ. of Sci. & Technol., Nanjing, China
fYear
2015
fDate
23-26 March 2015
Firstpage
1
Lastpage
4
Abstract
This paper gives a detail description of a silicon vibration beam accelerometer which was fabricated by SOI technology and encapsulated in a wafer level vacuum package. The wafer level package gives advantage of small size and low cost, but also produce additional residual stresses that increased the temperature coefficient of the vibration beams. To solve this problem, the sensing structure was redesigned and reduce the temperature coefficient from 50Hz/°C to 10Hz/°C. Moreover, with carefully assembly, control and measure technology, the accelerometer system achieved reliable performance. Experiment result shows that the scale factor was 120Hz/g, measurement rang was ±50g with non-linearity coefficients of 19μg/g2 and 0.06μg/g3, resolution was 10μg/sqrt(Hz), bias Allan variance was 10μg.
Keywords
accelerometers; elemental semiconductors; encapsulation; internal stresses; silicon; silicon-on-insulator; wafer level packaging; SOI technology; Si; encapsulation; residual stresses; sensing structure; silicon vibration beam accelerometer; temperature coefficient; wafer level vacuum package; Accelerometers; Frequency measurement; Micromechanical devices; Resonant frequency; Silicon; Temperature measurement; Vibrations; accelerometer; silicon; wafer level vacuum package;
fLanguage
English
Publisher
ieee
Conference_Titel
Inertial Sensors and Systems (ISISS), 2015 IEEE International Symposium on
Conference_Location
Hapuna Beach, HI
Type
conf
DOI
10.1109/ISISS.2015.7102378
Filename
7102378
Link To Document