• DocumentCode
    712859
  • Title

    100 V class multiple stepped oxide field plate trench MOSFET (MSO-FP-MOSFET) aimed to ultimate structure realization

  • Author

    Kobayashi, Kenya ; Nishiguchi, Toshifumi ; Katoh, Shunsuke ; Kawano, Takahiro ; Kawaguchi, Yusuke

  • Author_Institution
    Adv. Discrete Dev. Center, Toshiba Corp., Ishikawa, Japan
  • fYear
    2015
  • fDate
    10-14 May 2015
  • Firstpage
    141
  • Lastpage
    144
  • Abstract
    For low-voltage power MOSFETs technology, Field Plate (FP) and Superjunction (SJ) structures have been applied to reduce on-resistance drastically. As one of the approach for the ultimate structure realization, we propose a multiple stepped oxide FP-MOSFET (MSO-FP-MOSFET) that is extremely close to ideal gradient oxide structure. We have validated an optimum device structure by TCAD simulation and achieved lowest on-resistance of 28.5 mΩmm2 at breakdown voltage of 115.2 V. This performance indicates 25 % improvement compared to conventional devices. Moreover, to demonstrate the MSO-FP-MOSFET characteristics for the first time, we present some measurement data of TEG samples.
  • Keywords
    MOSFET; low-power electronics; semiconductor device breakdown; semiconductor junctions; MSO-FP-MOSFET; TCAD simulation; breakdown voltage; low-voltage power MOSFET technology; lowest on-resistance; multiple stepped oxide field plate trench; optimum device structure; superjunction structures; ultimate structure realization; voltage 100 V; voltage 115.2 V; Electric fields; Electric potential; Electrodes; Etching; Fabrication; Logic gates; MOSFET;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's (ISPSD), 2015 IEEE 27th International Symposium on
  • Conference_Location
    Hong Kong
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4799-6259-4
  • Type

    conf

  • DOI
    10.1109/ISPSD.2015.7123409
  • Filename
    7123409