DocumentCode
739495
Title
High-
Inductors Utilizing Thick Metals and Dense-Tapered Spirals
Author
Vanukuru, Venkata Narayana Rao
Author_Institution
Semicond. R&D Center, IBM India Pvt. Ltd., Bangalore, India
Volume
62
Issue
9
fYear
2015
Firstpage
3095
Lastpage
3099
Abstract
Ultra-thick metals are known to be counter productive for quality factor (Q) improvement at high frequencies in multiturn inductors. From the experimental results, assisted by electromagnetic simulations, it is first shown that Q improvement with ultra-thick metals can be pushed to higher frequencies using variable width and spaced (tapered) spirals. Furthermore, it is also shown that the extent of tapering is proportional to the metal thickness for the highest performance. Second, dense-tapered layouts are shown to be good candidates for higher Q rather than hollow ones for a given inductance density.
Keywords
Q-factor; inductors; dense tapered layouts; dense tapered spirals; high-Q inductors; multiturn inductor; quality factor; thick metals; Conductivity; Inductance; Inductors; Metals; Proximity effects; Spirals; Substrates; Current handling; fill factor (FF); proximity effect; quality factor; reverse excitation; self-resonant frequency (SRF); skin effect; tapered inductor; tapered inductor.;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2015.2458772
Filename
7175016
Link To Document