• DocumentCode
    739495
  • Title

    High- {Q} Inductors Utilizing Thick Metals and Dense-Tapered Spirals

  • Author

    Vanukuru, Venkata Narayana Rao

  • Author_Institution
    Semicond. R&D Center, IBM India Pvt. Ltd., Bangalore, India
  • Volume
    62
  • Issue
    9
  • fYear
    2015
  • Firstpage
    3095
  • Lastpage
    3099
  • Abstract
    Ultra-thick metals are known to be counter productive for quality factor (Q) improvement at high frequencies in multiturn inductors. From the experimental results, assisted by electromagnetic simulations, it is first shown that Q improvement with ultra-thick metals can be pushed to higher frequencies using variable width and spaced (tapered) spirals. Furthermore, it is also shown that the extent of tapering is proportional to the metal thickness for the highest performance. Second, dense-tapered layouts are shown to be good candidates for higher Q rather than hollow ones for a given inductance density.
  • Keywords
    Q-factor; inductors; dense tapered layouts; dense tapered spirals; high-Q inductors; multiturn inductor; quality factor; thick metals; Conductivity; Inductance; Inductors; Metals; Proximity effects; Spirals; Substrates; Current handling; fill factor (FF); proximity effect; quality factor; reverse excitation; self-resonant frequency (SRF); skin effect; tapered inductor; tapered inductor.;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2015.2458772
  • Filename
    7175016