SiO_x Deposition on Polypropylene-Coated Paper With a Dielectric Barrier Discharge at Atmospheric Pressure

Author

Li, Na ; Wu, Yui Lun ; Hong, Jungmi ; Shchelkanov, Ivan A. ; Ruzic, David N.

Author_Institution

College of Mechanical and Electrical Engineering, Harbin Institute of Technology, Harbin, China

Volume

43

Issue

9

fYear

2015

Firstpage

3205

Lastpage

3210

Abstract

Deposition of transparent oxide films at atmosphere pressure onto polymeric substrates at room temperature is a technique gaining rapid acceptance. These films can be used for numerous applications such as antiscratch and water permeation barrier coatings. In this paper, a $\\sim 1.4$ - $\\mu text{m}$ SiO_x layer has been deposited on polypropylene-coated paper at atmosphere pressure with a filamentary dielectric barrier discharge (DBD). The DBD linear discharge was driven by a 30-kHz power supply. Scanning electron microscope, X-ray photoelectron spectroscopy, and attenuated total reflection-Fourier transform infrared spectroscopy were used to characterize the deposited film. The deposited thin film decreased water permeation through the paper by $\\sim 15$ %.

Keywords

Coatings; Discharges (electric); Electrodes; Plasma temperature; Substrates; Surface treatment; Atmospheric pressure plasma deposition; SiOₓ film.; SiOx film; dielectric barrier discharge (DBD); polypropylene (PP);

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2015.2459720

Filename

7182351

SiOx Deposition on Polypropylene-Coated Paper With a Dielectric Barrier Discharge at Atmospheric Pressure

Li, Na ; Wu, Yui Lun ; Hong, Jungmi ; Shchelkanov, Ivan A. ; Ruzic, David N.

jour

SiO_x Deposition on Polypropylene-Coated Paper With a Dielectric Barrier Discharge at Atmospheric Pressure