• DocumentCode
    748378
  • Title

    Strained InAsN/InGaAs/InP multiple quantum well structures grown by RF-plasma assisted GSMBE for mid-infrared laser applications

  • Author

    Shih, D.-K. ; Lin, H.H. ; Lin, Y.H.

  • Author_Institution
    Dept. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
  • Volume
    150
  • Issue
    3
  • fYear
    2003
  • fDate
    6/17/2003 12:00:00 AM
  • Firstpage
    253
  • Lastpage
    258
  • Abstract
    The authors report the growth, structural and optical characteristics of strained 10-period InAs1-xNx/In0.53Ga0.47As multiple quantum well (MQW) structures on InP substrates grown by gas-source molecular beam epitaxy. Atomic nitrogen was generated using a RF-plasma cell. Double crystal X-ray diffractometer (DXRD) measurements indicated that adding N to the InAs layer reduced the net compressive strain of the MQW. The highest nitrogen composition obtained in this study was 19.5%. It was also found that the incorporation of nitrogen resulted in red-shifted photoluminescence (PL) emission energy of the QWs. However, increased nitrogen composition broadened the DXRD linewidth and degraded PL intensity. The very broad PL linewidth might be related to alloy inhomogeneity. Finally, ridge waveguide lasers with different periods (n=2-8) of InAs0.97N0.03/InGaAs QWs as the gain medium were fabricated. A device with four QWs gave the best performance and demonstrated pulsed oscillation up to 260 K at an emission wavelength of 2.38 μm with a threshold current density of 3.6 kA/cm2. This indicates the potential of InAsN as a material for mid-infrared applications.
  • Keywords
    III-V semiconductors; X-ray diffraction; chemical beam epitaxial growth; current density; gallium arsenide; indium compounds; infrared sources; photoluminescence; plasma deposition; quantum well lasers; semiconductor growth; semiconductor quantum wells; spectral line broadening; spectral line intensity; waveguide lasers; 10-period InAs1-xNx/In0.53Ga0.47As MQW structures; 2.38 micron; 260 K; DXRD linewidth broadening; InAs0.97N0.03-InGaAs; InAs0.97N0.03/InGaAs QWs; InAs1-xNx-In0.53Ga0.47As; InP; InP substrates; PL intensity; RF-plasma assisted GSMBE; RF-plasma cell; alloy inhomogeneity; atomic N; double crystal X-ray diffractometer measurements; emission wavelength; gas-source molecular beam epitaxy; mid-infrared laser applications; net compressive strain; nitrogen composition; optical characteristics; pulsed oscillation; red-shifted photoluminescence emission energy; ridge waveguide lasers; strained InAsN/InGaAs/InP multiple quantum well structures; structural characteristics; threshold current density;
  • fLanguage
    English
  • Journal_Title
    Optoelectronics, IEE Proceedings -
  • Publisher
    iet
  • ISSN
    1350-2433
  • Type

    jour

  • DOI
    10.1049/ip-opt:20030389
  • Filename
    1214752